01516nam a2200397 c 4500001001300000005001500013007000300028008004100031020003400072041001300106049002800119052001700147056001300164082001800177240008600195245013000281246006100411260004200472300004400514500005000558504003400608546004100642650004700683650005300730650004200783650004000825700002900865700001700894700004400911880003600955880003900991880002701030900003101057900001901088950001101107KMO20203257620240131144402ta200619s2020    ulkad         001   kor    a9791156108412g93560:c\520001 akorheng0 lEM7628159lEM7628160c201a569.4b20-13  a569.42601a621.3815222300aHandbook of silicon wafer cleaning technology.s3rd ed..l한국어0KAT202403470006880-01a웨이퍼 세정기술 =xWafer cleaning technology /d카렌 A. 라인하르트,e베르너 컨 저 ;e장인배 역19aHandbook of silicon wafer cleaning technologyg(3rd ed.)  6880-02a서울 :b씨아이알,c2020  axxix, 891 p. :b삽화, 도표 ;c26 cm  a원저자명: Karen A. Reinhardt, Werner Kern  a참고문헌과 색인 수록  a영어 원작을 한국어로 번역 8a웨이퍼(반도체)[wafer]0KSH1998015164 8a실리콘 웨이퍼[siliconwafer]0KSH2002025111 8a공정(생산)[工程]0KSH1998017222 8a세정기[洗淨器]0KSH19980026861 aReinhardt, Karen A.4aut1 aKern, Werner1 6880-03a장인배,d1964-0KAC201519419006245-01/(BaWeipeo sejeong gisul  6260-02/(BaSeoul :bSsiaial,c20201 6700-03/(BaJang, Inbae10a라인하르트, 카렌 A.10a컨, 베르너0 b\52000