01072nam a2200253 k 4500001001500000005001500015008004100030040001900071041001300090049003000103052002200133056001400155082001700169100004800186245015500234260003600389300002600425502008000451653012900531740008000660950002100740963002000761965003700781KDM199005270  20200821171946900823s1990    ulka       AB 000   kor    a011001c0110010 akorbeng0 lEM762734lEM770613c2fDP01a570.33b김821ㅇ  a570.33230 a660.28442191 a김종범,g金宗範,d1957-0KAC20182435900aNPCVD法에 依한 TiN 薄膜 蒸着에 關한 硏究=xStudies on TiN film deposition by normal pressure chemical vapor deposition method/d金宗範  a서울:b慶熙大學校,c1990  a66장:b삽도;c26cm1 a학위논문(박사) --b慶熙大學校 大學院:c화학공학과,d1990  aNPCVD법aTINa박막a증착aFILMaDEPOSITIONaNORMALaPRESSUREaCHEMICALaVAPORaMETHODa엔피시브이디법a티아이0 a엔피시브이디법에 의한 티아이엔 박막 증착에 관한 연구1 a비매품b\3100  a화학공학과  a화학증착법x틴박막증착