01238cam a22003131i 4500001001300000005001500013007000300028008004100031040003200072041001300104049001800117052001600135056001300151082001400164100004800178245012200226264004400348300005300392336002600445337002900471338002700500500002700527502013700554504004000691546003400731856012400765900001600889900001900905KDM20197983520200728093646ta190103s2019    ulka     m AL 000c  eng    a241026c011012d011001erda0 aengbkor0 lWM959589fWDP02a530.4b19-4  a420.42601a530.42231 a반원진,g潘元珍,d1985-0KAC20187593310aMetal-oxide doped carbon films deposited by PECVD with high etch selectivity for semiconductor hardmask /dWonjin Ban 1aSeoul :bSungkyunkwan University,c2019  a101 pages :billustrations (some color) ;c30 cm  atextbtxt2rdacontent  aunmediatedbnc2rdamedia  avolumebnc2rdacarrier  aAdviser: Donggeun Jung0 aThesis(Ph.D.) --bGraduate School, Sungkyunkwan University,cConcentration in Condensed Matter Physics, Department of Physics,d2019  aIncludes bibliographical references  aIn English; summary in Korean40uhttp://www.riss.kr/link?id=T15072912nKERISz이 자료의 원문은 한국교육학술정보원에서 제공합니다.10aBan, Wonjin10aJung, Donggeun