01354nam a2200241 k 4500001001300000005001500013008004100028041001300069049003400082052001500116056001300131082001800144245021200162260003600374300003000410502009000440590003000530650005200560653033900612700005300951740009701004890001101101KDM20041448720040305165314040305s2003    ulka       AKh000   kor  0 akorbeng0 lEM2987124lEM2987125c複fDP01a569.4b4-3  a569.4240 a621.3815222100aESBM 공정 기술의 개발과 관성 센서에의 응용=xDevelopment of the ESBM(extended sacrificial bulk micromachining) technology and its application to the fabrication of inertial sensor/d金鍾팔  a서울:b서울大學校,c2003  aix, 183p.:b삽도;c26cm1 a학위논문(박사) --b서울대학교 대학원:c전기.컴퓨터공학과,d2003  y열람용은 복사본임 8a실리콘 반도체[--半導體]0KSH1998009987  aESBMa(111) 실리콘a실리콘aSILICONa미세가공기술a수직콤a완전단차a단결정 실리콘 구조물a단결정 실리콘aZ축 가속도계aX축 각속도계a(111) SILICONaVERTICAL COMBaPERFECT OFFSETaSINGLE-CRYSTALLINE STRUCTUREaZ-AXIS ACCELEROMETERaX-AXIS GYROSCOPEaEXTENDED SACRIFICIAL BULK MICROMACHINING1 a김종팔,g金鍾汃,d1972-0KAC2020036914aut0 aDevelopment of the ESBM technology and its application to the fabrication of inertial sensor  h245팔