01189nam a2200325 c 4500001001300000005001500013007000300028008004100031020003400072041001300106049002800119052001700147056001400164082001900178245009700197246005100294260004200345300004300387504003300430546004100463650006000504700002100564700004400585765009800629880003400727880003900761880002700800900002500827950001100852KMO20161165820171117153845ta160310s2016    ulkad         001   kor    a9791156101963g93550:c\450001 akorheng0 lEM6354046lEM6354047c201a569.31b16-1  a569.312601a621.381531223006880-01a포토마스크 기술 =xPhotomask technology /dSyed Rizvi 편저 ;e장인배 역19aHandbook of photomask manufacturing technology  6880-02a서울 :b씨아이알,c2016  axvi, 875 p. :b삽화, 도표 ;c26 cm  a참고문헌과 색인수록  a영어 원작을 한국어로 번역 8a인쇄 회로 기판[印刷回路基板]0KSH19980006371 aRizvi, Syed4aut1 6880-03a장인배,d1964-0KAC2015194190 tHandbook of photomask manufacturing technologyz0824753747 (alk. paper)w(011001)WMO200605590006245-01/(BaPotomaseukeu gisul  6260-02/(BaSeoul :bSsiaial,c20161 6700-03/(BaJang, Inbae10a리즈비, 시에드0 b\45000