00837nam a2200193 c 4500001001300000005001500013007000300028008004100031040001100072041001300083052002900096245016100125300002400286545005000310653008300360700005300443773012900496900001800625KSI00076070820091020100545ta090608s1992    ulk           000   kor    a0110010 akorbeng01a530.405b한596ㅎc2(2)00aRF sputter 방법으로 제조한 투명전도막 ZnO 특성 =xProperties of transparent conducting zinc oxide films prepared by RF sputtering /d최병호  ap. 360-365 ;c30 cm  a최병호, 금오공과대학 재료공학과  a투명전도막aZinc oxide filmsaRF sputteringaTransparent conducting films1 a최병호,g崔炳浩,d1952-0KAC2018468674aut0 t한국재료학회지.d韓國材料學會.g2권 5호(1992년 10월), p. 360-365q2:5<350w(011001)KSE199509224,x1225-056210aChoi, Byungho