01164nam a2200205 c 4500001001300000005001500013008004100028040001100069041001300080052003700093245018500130300002100315545009000336545006100426653025600487700005300743700001900796773012700815900001600942KSI00058095620060919105302060914s2004    ulk           000   kor    a0110010 akorbeng01a554.9405b한622ㅎc13(1)-13(4)00aSIMS와 GDMS를 이용한 구리와 탄탈 박막내의 주요불순물 분석=xAnalysis of dominant impurities in Cu and Ta films using SIMS and GDMS/d임재원,eMinoru Isshiki  ap. 79-85;c26 cm  a임재원, 동북대학 다원물질과학연구소bflashlim@mail.tagen.tohoku.ac.jp  aMinoru Isshiki, 동북대학 다원물질과학연구소  a이온빔 증착a구리a탄탈a불순물a기판 바이어스a이차이온 질량분석a글로우방전 질량분석aIon beam depositionaCopperaTantalumaImpurityaBias voltageaSecondary ion mass spectrometryaGlow discharge mass spectrometry1 a임재원,g林載元,d1972-0KAC2016240254aut1 aMinoru Isshiki0 t한국진공학회지.d韓國眞空學會.g13권 2호(2004년 6월), p. 79-85q13:2<79w(011001)KSE199508370,x1225-882210aLim, Jaewon