01081nam a2200265 a 4500001001300000005001500013007000300028008004100031041001300072049001800085052002100103056001300124082001800137100003600155245027000191260003300461300004200494502010800536504003200644546003500676900002700711900002500738900002600763900002600789KDM20125103220211018091642ta121016s2012    ulkad    m AQ 000   eng  0 aengbkor0 lWM715796fWDM02a621.38152b12-81  a569.42501a621.381522211 a윤재홍,d1984-0KAC20187423210aStudy on properties and their applications of plasma enhanced atomic layer deposition of Co using N₂/H₂ plasma as a reactant =xN₂/H₂플라즈마를 이용한 원자층증착법으로 증착된 Co 박막의 특성 및 응용에 대한 연구 /dJaehong Yoon  aSeoul :bYonsei Univ.,c2012  av, 39 leaves :bill., charts ;c26 cm0 aThesis(M.A.) --bGraduate School, Yonsei Univ.,cDept. of Electrical and Electronic Engineering,d2012.  aBibliography: leaves 34-37.  aIn English; summary in Korean.10aYoon, Jae-hong,d1984-10aYun, Jaehong,d1984-10aYun, Jae-Hong,d1984-10aYoon, Jaehong,d1984-