01086nam a2200253 a 4500001001300000005001500013007000300028008004100031049001800072052001800090082001600108100004800124245012900172246010400301246007700405260005800482300003300540502007900573504005300652650002800705856006400733900002400797950001100821WDM20120037920201109131945ta111208s2007    us a     m    000   eng  0 lWM684959fWDP02a621.364b12-101a621.3642211 a육세진,g陸世鎭,d1974-0KAC20170555310aModeling, detection and protection schemes for extreme ultraviolet lithography (EUVL) mask carrier systems /dby Se-Jin Yook30aModeling, detection and protection schemes for extreme ultraviolet lithography mask carrier systems30aModeling, detection and protection schemes for EUVL mask carrier systems  aAnn Arbor, Mich. :bUMI Dissertation Services,cc2007  axxi, 171 p. :bill. ;c23 cm1 aThesis (Ph.D.) --bUniversity of Minnesota,cMechanical Engineering,d2006  aIncludes bibliographical references (p. 164-171) 4aEngineering, Mechanical  uhttp://search.proquest.com/docview/304837737?accountid=801510aYook, Sejin,d1974-0 bUS$108