01089nam a2200217 c 4500001001300000005001500013008004100028040001100069041001300080052002800093245021600121300002300337545004700360545004700407653014100454700001900595700004800614773017200662900001700834900002000851KSI00018586820040520195858040505s1999    ulk           000   kor    a0110010 akorbeng01a469.05b한428ㅎc9(2)00a표면 활성화 처리가 비정질 규소 박막의 결정화에 미치는 영향=x(The)effect of the surface activation treatment on the crystallization of amorphous silicon thin film/d이의석,e김영관  ap. 173-179;c29 cm  a이의석, 인천대학교 재료공학과  a김영관, 인천대학교 재료공학과  a표면 활성화 처리a비정질규소a박막a결정화aSurface activation treatmentaCrystallizationaAmorphous siliconaThin film1 a이의석4aut1 a김영관,g金榮寬,d1954-0KAC2018M24010 tJournal of the Korean crystal growth and crystal technology.d韓國結晶成長學會.g9권 2호(1999년 4월), p. 173-179q9:2<173w(011001)KSE199508766,x1225-142910aLee, Ui Sock10aKim, Young Kwan