01140nam a2200265 c 4500001001300000005001500013008004100028040001100069041001300080052003400093245013400127300003200261545004700293545006500340545006600405653010000471700001400571700004100585700004800626773012500674856002000799900001900819900001800838900001800856KSI00004083520040128182713031010s2001    ulka          000   kor    a0110010 akorbeng01a570.5b한648ㅎc39(4)-39(6)00aESCA를 이용한 웨이퍼의 세정도 측정=xMeasurement of cleanliness of wafer by ESCA/d이광진,e정용안,e노경호  ap. 715-720:b삽도;c29 cm  a이광진, 인하대학교 화학공학과  a정용안, 한국기기유화시험연구원 연구개발팀  a노경호, 인하대학교 화학공학과browkho@inha.ac.kr  a화학공학a웨이퍼a세정도측정aAltemative cleaning solventaCleanlinessaWaferaESCA1 a이광진1 a정용안,d1970-0KAC2016250414aut1 a노경호,g盧敬昊,d1959-0KAC2018168800 t화학공학.d한국화학공학회.g39권 6호(2001년 12월), p. 715-720q39:6<715w(011001)KSE199509737,x0304-128X40uT00000364335ad10aLee, Kwang Jin10aJung, Yong An10aRow, Kyung Ho