01371na  a2200337   4500001001300000005001500013008004100028040001100069041001300080052002900093245016900122300003200291545004000323545004000363545004000403545004000443545004000483653011200523700001900635700004800654700004800702700003600750700001400786773012200800856002000922900001900942900001800961900001900979900001600998900001901014KSI00007443620040126155041031121s1998    ulka          000   kor    a0110010 akorbeng01a433.905b한437ㅇc2(1)00a질산 용액에서 은의 전착회수=xRemoval of silver by electrodeposition in nitric acid solution/d최왕규,e이근우,e김영민,e송기찬,e오원진  ap. 372-375:b삽도;c26 cm  a최왕규, 한국원자력연구소  a이근우, 한국원자력연구소  a김영민, 한국원자력연구소  a송기찬, 한국원자력연구소  a오원진, 한국원자력연구소  a질산a질산용액a은a전착a전착회수aRemovalaSilveraElectrodepositionaNitricaAcidaSolution1 a최왕규4aut1 a이근우,g李根宇,d1953-0KAC2018442881 a송기찬,g宋基瓚,d1959-0KAC2018466341 a오원진,d1947-0KAC2019F55041 a김영민0 t응용화학.d한국공업화학회.g2권 1호(1998년 5월), p. 372-375q2:1<372w(011001)KSE199801113,x1226-880140u3145650aKd00010aChoi, Wang-Kyu10aLee, Kune-Woo10aSong, Kee-Chan10aOh, Won-Zin10aKim, Young-Min